Samsung Pushes High-NA EUV Adoption to 2030 for 1 Nm Work

Posted on
Samsung Foundry is reportedly delaying High-NA EUV deployment until 2030 for its 1 nm node, favoring lower-cost Low-NA tools for now.

Quick Report

Samsung Foundry is reportedly delaying the adoption of High-NA EUV lithography until 2030 for its 1 nm node. The company is expected to continue relying on Low-NA EUV tools for the near term, as they can still deliver substantial gains through multi-patterning and other process tricks.

The decision aligns with a broader industry pattern in which leading fabs are balancing the massive cost of next-generation tooling against the incremental benefits it offers. With High-NA systems costing hundreds of millions of dollars each, delaying deployment helps keep capital spending under control while maintaining a competitive path to smaller nodes.

Written using GitHub Copilot GPT-5 mini in agentic mode instructed to follow current codebase style and conventions for writing articles.

Source(s)

  • TPU