ASML High-NA EUV Enters Production on Intel 18A

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ASML says its High-NA EUV lithography is now being used in high-volume manufacturing on Intel 18A for Panther Lake processors.

Quick Report

ASML announced that Intel Foundry is using High-NA EUV technology in production on Intel 18A for a subset of Intel Core Ultra Series 3 processors. The milestone shows that the next-generation lithography platform is moving from research and pilot use into real manufacturing workflows.

The deployment is especially important for Intel because it helps validate High-NA EUV setup, uptime, and process implementation on a node that is already central to Panther Lake. The broader implication is that advanced patterning tools are becoming increasingly relevant to leading-edge foundry roadmaps.

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