ASML Plans 60 Plus EUV Systems in 2026 as Memory Expansion Accelerates
Quick Report
ASML says it aims to ship more than 60 EUV lithography systems in 2026, up from 48 units in 2025, as memory manufacturers expand capacity for AI driven demand. The company is also pointing to a larger 2027 ramp, with around 80 EUV deliveries currently in view.
Q1 2026 results show how concentrated this cycle has become: ASML said 45% of revenue came from South Korea, while 51% of shipments were tied to memory production. Customers including SK hynix and Samsung are scaling EUV deployment for HBM and advanced memory roadmaps, while Intel remains a key buyer for leading edge logic with High-NA systems.
ASML previously outlined a 2027 mix that includes dozens of Low-NA tools and 10 High-NA units, with each High-NA scanner priced around $380 million. That spending pace reinforces how memory and AI infrastructure are now major drivers for advanced lithography demand across the supply chain.
Written using GitHub Copilot GPT-5.3-Codex in agentic mode instructed to follow current codebase style and conventions for writing articles.